The LEELIS-III workshop will be held in Amsterdam on 12th – 13th November 2018 and Demaco Vacuum Technology will be present as one of the sponsors. It is a unique platform to focus on the role of low-energy electrons in imaging and nanolithography. While low-energy electrons play a key role in very diverse processes, ranging from radiology to astrochemistry, they are of particular importance for industrial extreme ultraviolet lithography (EUVL) and low-energy electron microscopy (LEEM).
Experts from complementary fields such as condensed matter physics, EUVL, low-energy electron microscopy and engineering will be brought together to come to novel insights on the physics of low-energy electrons, and the chemistry they induce.
